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Process simulation Maria Concetta Allia
Athena overview Athena is a process simulator that provides general capabilities for numerical, physically-based, two-dimensional simulation of processes used in semiconductor industry (ion implantation, diffusion, oxidation, physical etching and deposition, lithography,…). Athena input file It is a text file that can be arranged by using Deckbuild or any text editor. It collects a sequence of commands (statements) corresponding to the individual steps of a process flow and control commands specified to select physical models and parameters. Athena simulation Generating Athena input file Running Athena simulation Analyzing Athena output file IMS CAD & Design Services Maria Concetta Allia Process 2
Simulation problem specification The simulation problem must be specified in the input file, defining the following steps: Initial geometry Sequence of process steps Physical models Simulation grid Initial substrate Epitaxial growth Layers deposition Geometrical etching Ion implantation Diffusion Implant models Diffusion models Oxidation models IMS CAD & Design Services Maria Concetta Allia Process 3
Running Athena simulation Running Athena inside Deckbuild To run Athena inside Deckbuild use the following command line: > go athena Running a given Athena version The syntax is: > go athena simflags=“-V 5.8.0.R” Running Athena without Deckbuild To run Athena directly under unix use the following command line: > athena > athena –V 5.8.0.R IMS CAD & Design Services Maria Concetta Allia Process 4
Athena output file The main Athena output is the Standard Structure File, a universal file format used by Silvaco simulation programs. The STRUCTURE statement of Athena creates a Standard Structure File (.str), which contains mesh and solution information, model information, and other related parameters. The saved Structure File can be used by: Athena to continue process simulation Atlas or other device simulators to perform electrical analysis Tonyplot to graphically display the structure created by Athena Devedit to modify the mesh and the structure before running a device simulation IMS CAD & Design Services Maria Concetta Allia Process 5
Question 1 A process simulation problem must be specified in the: a) output file b) input file c) Standard Structure File IMS CAD & Design Services Maria Concetta Allia Process 6
Creating a device structure The following section will describe how to use Deckbuild interface in order to create a typical Athena input file. In particular, the process simulation of a simple pn diode is described. Basic operations to create the input file Developing a good simulation grid Defining initial substrate Performing layer deposition Performing geometrical etching Performing ion implantation and diffusion Specifying the electrodes Saving the structure file IMS CAD & Design Services Maria Concetta Allia Process 7
Running Athena inside Deckbuild The Commands menu includes the statements of the current simulator To define simulation grid To define initial substrate To specify process steps To specify electrodes To access Athena coefficients file To generate Extract statement To save a structure file IMS CAD & Design Services Maria Concetta Allia Process 8
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