Semiconductor Physics and Devices 
Basic Principles 
Third Edition 
Donald A. Neamen 
Univer.\ip of  New Mexico 
Boston  Burr Ridge. lL  Dubuque. lA  Mad~son W  New York  San Francisco  St  Louis 
Bangkok  Bogota  Caracas  KualaLurnpur  Lisbon  London  Madr~d Mex~coClty 
Milan  Montreal  NewDeIhl  Sant~ago  Seoul  Singapore  Sydney  Ta~pel  Toronto 
McGraw-Hill Higher- Education 
A  llivlsion of The McGraw-Hill Compav~ies 
SEMICONDUCTOR PHYSICS AND DEVICES: BASIC PRINCIPLES 
THIRD EDITION 
Published by McGraw-Hill, a business unit of The McGraw-Hill Companies, Inc., 1221 
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Library of Congress Cataloging-in-Publication Data 
Neamen, Donald A. 
Semiconductor physics and devices : basic principles 1 Donald A. Neamen. - 3rd ed. 
p. 
cm. 
Includes bibliographical references and index. 
ISBN 0-07-232 107-5 (acid-free paper) 
I. Semiconductors.  I. Title. 
2002019681 
CIP 
INTERNATIONAL EDITION  ISBN 0-07-1 19862-8 
Copyright O 2003. Exclusive rights by The McGraw-Hill Companies, Inc., for manufacture and 
export. This book cannot be re-exported from the country to which it is sold by McGraw-Hill. 
The International Edition is not available in North America. 
A B O U T   T H E  A U T H O R  
Donald  A.  Neamen  is  a  professor  emerltus  in  the  Department  of  Electrical  and 
Computer Engineering at the University of New Mexico where he taught for more than 
25 years. He received his Ph.D. from the University of New Mexico and then became 
an electronics engineer at the Solid State Sciences Laboratory at Hanscom Air Force 
Base. In 1976, he joined the faculty in the EECE department at the University of New 
Mexico, where he specialized in teaching semiconductor physics and devices courses 
and electronic circuits courses. He is still a part-time instructor in the department. 
In  1980,  Professor  Neamen  received  the  Outstanding  Teacher  Award  for  the 
University  of  New  Mexico.  In  1983 and  1985, he was  recognized  as Outstanding 
Teacher in the College of Engineering by Tau Beta Pi. In  1990, and each year from 
1994 through 2001, he received the Faculty Recognition Award, presented by gradu- 
ating EECE students. He was also honored with the Teaching Excellence Award in the 
College of Engineering in 1994. 
In addition  to his teaching, Professor Neamen served as Associate Chair of the 
EECE  department  for  several  years  and  has  also  worked  in  industry  with  Martin 
Marietta, Sandia National Laboratories, and  Raytheon Company. He has published 
many papers and is the author of Electronic Circuit Analysis and Design, 2nd edition. 
C O N T E N T S   I N   B R I E F  
Chapter 1 
Chapter 2 
Chapter 3 
Chapter 4 
Chapter 5 
Chapter 6 
Chapter 7 
Chapter 8 
Chapter 9 
Chapter 10 
Chapter 11 
Chapter 12 
Chapter 13 
Chapter 14 
Chapter 15 
Appendix A 
Appendix B 
Preface  xi 
The Crystal Structure of Solids 
I 
lntroduction to Quantum Mechanics  24 
Introduction to the Quantum Theory of Solids  56 
The Semiconductor in Equilibrium  103 
Carrier Transport Phenomena  154 
Nonequilibrium Excess Carriers in Semiconductors  189 
The pn Junction  238 
The pn Junction Diode  268 
Metal-Semiconductor and Semiconductor 
Heterojunctions  326 
The Bipolar Transistor  367 
Fundamentals of the Metal-Oxide-Semiconductor 
Field-Effect Transistor  449 
Metal-Oxide-Semiconductor Field-Effect Transistor: 
Additional Concepts  523 
The Junction Field-Effect Transistor  570 
Optical Devices  617 
Semiconductor Power Devices  668 
Selected List of Symbols  703 
System of  Units, Conversion Factors, and General 
Constants  7 11 
Appendix C 
The Periodic Table  7 15 
Appendix D 
Appendix E 
Appendix F 
Appendix G 
The Error Function  7 17 
"Derivation" of Schrodinger's  Wave Equation  719 
Unit of Energy-The Electron-Volt  721 
Answers to Selected Problems  723 
Index  731 
C O N T E N T S  
Preface  xi 
C H A P T E R  1 
The Crystal Structure of Solids  1 
Preview  1 
1.1  Semiconductor Materials  1 
1.2  Types of Solids  2 
1.3  Space Lattices  3 
1.3.1  Primitive and Unit Cell  3 
1.3.2  Basic Crystal Structures  4 
1.3.3  Crystal Planes and Miller lndices  5 
1.3.4  The Diamond Structure  9 
1.4  Atomic Bonding  11 
"1.5  Imperfections and Impurities in Solids  13 
1.5.1 
1.5.2 
Impegections in Solids  13 
lmpurities in Solids  15 
*1.6  Growth of Semiconductor Materials  16 
1.6.1  Growthfrom a Melt  16 
1.6.2  Epitaxial Growth  18 
1.7  Summary  19 
Problems  21 
C H A P T E R  2 
Introduction to Quantum Mechanics  24 
Preview  24 
2.1  Principles of Quantum Mechanics  25 
2.1.1  Energy Quanta  25 
2.1.2  Wave-Particle Duality  26 
2.1.3  The Uncertainty Principle  29 
2.2  Schrodinger's  Wave Equation  30 
2.2.1  The Wave Equation  30 
2.2.2  Physical  Meaning of the Wave 
Function  32 
2.2.3  Boundary Conditions  32 
2.3  Applications of Schrodinger's Wave 
Equation  33 
2.3.1  Electron in Free Space  33 
2.3.2  The Injnite Potential Well  34 
2.3.3  The Step Potential Function  38 
2.3.4  The Potential Barrier  42 
*2.4  Extensions of the Wave Theory to Atoms  45 
2.4.1  The One-Electron Atom  45 
2.4.2  The Periodic Table  48 
2.5  Summary  50 
Problems  51 
C H A P T E R  3 
Introduction to the Quantum Theory 
of Solids  56 
Preview  56 
3.1  Allowed and Forbidden Energy Bands  57 
3.1.1  Formation of  Energy Bands  57 
*3.1.2  The Kronig-Penney  Model  61 
3.1.3  The k-Space Diagram  66 
3.2  Electrical Conduction in Solids  70 
3.2.1  The Energy Band and the Bond Model  70 
3.2.2  Drift Current  72 
3.2.3  Electron Effective Mass  73 
3.2.4  Concept of the Hole  76 
3.2.5  Metals, Insulators, and 
Semiconductors  78 
3.3  Extension to Three Dimensions  80 
3.3.1  The k-Space Diagrams of Si and GaAs  81 
3.3.2  Additional Effective Mass Concepts  82 
3.4  Density of States Function  83 
3.4.1  Mathematical  Derivation  83 
3.4.2  Extension to Semiconductors  86 
3.5  Statistical Mechanics  88 
3.5.1  Statistical Laws  88 
vi 
Contents 
3.5.2  The Fermi-Dirac Probability Function  89 
3.5.3  The Distribution Function and the 
Fermi Energy  91 
C H A P T E R  5 
Carrier Transport Phenomena  154 
3.6  Summary  96 
Problems  98 
C H A P T E R  4 
The Semiconductor in Equilibrium  103 
Preview  103 
4.1  Charge Carriers in Semiconductors  104 
4. I. 1  Equilibrium Distribution of Electrons 
and Holes  104 
4.1.2  The no and p, Equations  106 
3.1.3  The Intrinsic Carrier Concentration  110 
4.1.4  The Intrinsic Fermi-Level 
Position  113 
4.2  Dopant Atoms and Energy Levels  1 15 
4.2. I  Qualitative Description 
4.2.2 
Ionization Energy  11 7 
4.2.3  Group 111-V  Semiconductors  119 
I15 
4.3  The Extrinsic Semiconductor  120 
4.3.1  Equilibrium Distribution of Electrons 
and Holes  121 
4.3.2  The nap, Product  124 
*4.3.3  The Ferrni-Diruc  lntegral  125 
4.3.4  Degenerate and Nondegenerate 
Semiconductors  127 
4.4  Statistics of Donors and Acceptors  128 
4.4. I  Probability Function  128 
4.4.2  Complete Ionization and  Freeze-Out  129 
4.5  Charge Neutrality  132 
4.5.1  compensated Semiconductors  133 
4.5.2  Equilibrium Electron and Hole 
Concentrations  133 
4.6  Position of Fermi Energy Level  139 
4.6.1  Mathematical Derivation  139 
4.6.2  Variation of E,  with Doping Concentration 
and Temperature  142 
4.6.3  Relevance of the Fermi Energy  144 
4.7  Summary 
145 
Problems  148 
Preview  154 
5.1  Carrier Drift  154 
5.1.1  Drift Current Density  155 
5.1.2  Mobiliv Effects  157 
5.1.3  Conductivity  162 
5.1.4  Velocity Saturation  167 
5.2  Carrier Diffusion  169 
5.2.1  Dzffusion Current Density 
5.2.2  Total Current Density  173 
I70 
5.3  Graded Impurity Distribution  173 
5.3.1 
Induced Electric Field  174 
5.3.2  The Einstein Relation  176 
"5.4  The Hall Effect  177 
5.5  Summary  180 
Problems  182 
C H A P T E R  6 
Nonequilibrium Excess Carriers 
in Semiconductors  189 
Preview  189 
6.1  Carrier Generation and Recombination  190 
6.1.1  The Semiconductor in Equilibrium  190 
6.1.2  Excess Carrier Generation 
and Recombination  191 
6.2  Characteristics of Excess Carriers  194 
6.2.1  Continuity Equations  195 
6.2.2  Time-Dependent Diffusion 
Equations  196 
6.3  Ambipolar Transport  197 
6.3.1  Derivation ofthe Ambipolar 
Transport Equation  198 
6.3.2  Limits of  Extrinsic Doping 
and Low Injection  200 
6.3.3  Applications of the Ambipolar 
Transport Equation  203 
6.3.4  Dielectric Relaxation Time Constant  211 
"6.3.5  Huynes-Shockley  Experiment  213 
6.4  Quasi-Fermi Energy Levels  21 6 
*6.5  Excess-Carrier Lifetime  21 8 
6.5.1  Shockley-Read-Hall Theory 
of  Recombination  21 9 
6.5.2  Limits of Extrinsic Doping 
and Low Injection  222 
"6.6  Surface Effects  224 
6.6.1  Su@ceStates 
6.6.2  Surjiace Recombination Velocity  226 
224 
6.7  Summary  229 
Problems  231 
C H A P T E R  7 
The pn Junction  238 
Preview  238 
7.1  Basic Structure of the pn Junction  238 
7.2  Zero Applied Bias  240 
7.2.1  Built-in Potential Barrier  240 
7.2.2  Electric Field  242 
7.2.3  Space Charge Width  246 
7.3  Reverse Applied Bias  247 
7.3.1  Space Charge Width and Electric 
Field  248 
7.3.2  Junction Capacitance  251 
7.3.3  One-Sided Junctions  253 
*7.4  Nonuniformly Doped Junctions  255 
7.4.1  Linearly Graded Junction  255 
7.4.2  Hyperabrupt Junctions  258 
7.5  Summary  260 
Problems  262 
C H A P T E R  8 
The pn Junction Diode  268 
Preview  268 
8.1  pn Junction Current  269 
8.1.1  Qualitative Description of Charge Flow 
in a pn Junction  269 
Ideal Current-Voltage Relationship  270 
8.1.2 
8.1.3  Boundary Conditions  271 
8.1.4  Minority Carrier Distribution  275 
8.1.5 
8.1.6  Summary of  Physics  281 
Ideal pn Junction Current  277 
8.1.7  Temperature Effects  284 
8.1.8  The "Short"  Diode  284 
8.2  Small-Signal Model of the pn Junction  286 
8.2.1  Diffusion Resistance  286 
8.2.2  Small-Signal  Admittance  288 
8.2.3  Equivalent Circuit  295 
8.3  Generation-Recombination Currents  297 
8.3.1  Reverse-Bias Generation Current  297 
8.3.2  Forward-Bias Recombination Current  300 
8.3.3  Total Forwurd-Bias Current  303 
8.4  Junction Breakdown  305 
"8.5  Charge Storage and Diode Transients  309 
8.5.1  The Turn-off Transient  309 
8.5.2  The Turn-on Transient  312 
"8.6  The Tunnel Diode  3 13 
8.7  Summary  3 16 
Problems  3 18 
C H A P T E R  9 
Metal-Semiconductor and Semiconductor 
Heterojunctions  326 
Preview  326 
9.1  The Schottky Barrier Diode  326 
Ideal Junction Properties  329 
9.1. I  Qualitative Characteristics  327 
9.1.2 
9.1.3  Nonideal Effects on the Barrier Height  333 
9.1.4  Current-Voltage Relationship  337 
9.1.5  Comparison rdthe Schottky Barrier Diode 
and the pn Junction Diode  341 
9.2  Metal-Semiconductor Ohmic Contacts  344 
Ideal Nonrectifying Barriers  345 
9.2.1 
9.2.2  Tunneling Barrier  346 
9.2.3  Spec$c  Contact Resistance  348 
9.3  Heterojunctions  349 
9.3.1  Heterojunction Materials  350 
9.3.2  Energy-Band Diagrams  350 
9.3.3  Two-Dimensional Electron Gas  351 
*9.3.4  Equilibrium Electrostatics  354 
*9.3.5  Current-Voltage Characteristics  359 
9.4  Summary  359 
Problems  361 
viii 
Contents 
C H A P T E R   10 
The Bipolar Transistor  367 
Preview  367 
10.1  The Bipolar Transistor Action  368 
10.1.1  The Basic Principle of Operation  369 
10.1.2  Simplified Transistor Current 
Relations  370 
10.1.3  The Modes of Operation  374 
10.1.4  Amplification with Bipolar 
Transistors  376 
10.2  Minority Carrier Distribution  377 
10.2.1  Forward-Active Mode  378 
10.2.2  Other Modes of Operation  384 
10.3  Low-Frequency Common-Base 
Current Gain  385 
10.3.1  Contributing Factors  386 
10.3.2  Mathematical Derivation of  Current 
Gain Factors  388 
10.3.3  Summary  392 
10.3.4  Example Calculations of the 
Gain Factors  393 
10.4  Nonideal Effects  397 
10.4.1  Base Width Modulation  397 
10.4.2  High lnjection  401 
10.4.3  Emitter Bandgap Narrowing  403 
10.4.4  Current Crowding  405 
*10.4.5  Nonuniform Base Doping  406 
10.4.6  Breakdown Voltage  408 
10.5  Equivalent Circuit Models  41 3 
"10.5.1  Ebers-Moll Model  414 
10.5.2  Gummel-Poon  Model  416 
10.5.3  Hybrid-Pi Model  418 
10.6  Frequency Limitations  422 
10.6.1  Time-DelayFactors  422 
10.6.2  Transistor Cutoff Frequency  424 
10.7  Large-Signal Switching  427 
10.7.1  Switching Characteristics  427 
10.7.2  The Schottky-Clamped Transistor  429 
*10.8  Other Bipolar Transistor Structures  430 
10.9  Summary  435 
Problems  438 
C H A P T E R   11 
Fundamentals of the Metal-Oxide- 
Semiconductor Field-Effect Transistor  449 
Preview  449 
11.1  The Two-Terminal MOS Structure  450 
11.1.1  Energy-Band Diagrams  450 
11.1.2  Depletion Layer Thickness  455 
11.1.3  Work Function Differences  458 
11.1.4  Flat-Band Voltage  462 
11.1.5  ThresholdVoltage  465 
11.1.6  Charge Distribution  471 
11.2  Capacitance-Voltage Characteristics  474 
Ideal C-V Characteristics  474 
11.2.1 
11.2.2  Frequency Effects  479 
11.2.3  Fixed Oxide and lnte8ace 
Charge Effects  480 
11.3  The Basic MOSFET Operation  483 
11.3.1  MOSFETStructures  483 
11.3.2  Current-Voltage Relationship- 
Concepts  486 
"11.3.3  Current-Voltage Relationship- 
Mathematical Derivation  490 
11.3.4  Transconductance  498 
11.3.5  Substrate Bias Effects  499 
11.4  Frequency Limitations  502 
11.4.1  Small-Signal Equivalerzt Circuit  502 
11.4.2  Frequency Limitation Factors 
and Cutoff Frequency  504 
'11.5  The CMOS Technology  507 
4 
11.6  Summary  509 
Problems  5 13 
C H A P T E R   12 
Metal-Oxide-Semiconductor Field-Effect 
Transistor: Additional Concepts  523 
10.8.1  Polysilicon Emitter BJT  430 
10.8.2  Silicon-Germanium Base Transistor  431 
10.8.3  Heterojunction Bipolar Transistors  434 
Preview  523 
12.1  Nonideal Effects  524 
12.1.1  Subthreshold Conduction  524