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ASML_Reticle_manual_Final_2007.pdf
Reticle Design Manual
Reticles for 4x reduction
Definitions of terms and concepts
Introduction
The definition of a location on a reticle
Reticle Layout and Orientation
The definition of chromium border
Name conventions for TIS marks
Generic Information on Reticle Design
Reticle substrate Specifications
The birefringence of the substrate
Phase Shift Mask (PSM) reticles
Reticle compatibility
Contamination and Defects
Bar code
Reticle prealignment mark
Reticle alignment mark
Reticle Data files
Reticle Database Format information
Typical usage
Data files on Wafer Alignment Marks
Reticles Patterns (4x reduction)
Reticle Prealignment mark
Reticle alignment mark for PAS 5500
TIS marks for Reticle Blue Alignment
The chromium borders for TIS_RBA marks
TIS_RBA-mark dimensions
Required chromium border between image field and TIS mark
TIS marks placement on production reticles
TIS marks for Reticle Shape Correction
The layout of TIS_RSC marks
Chromium borders for vertical TIS_RSC marks
Chromium border between image field and vertical TIS_RSC marks
Vertical TIS_RSC marks placement on production reticles
How to deal with third-party reticle patterns
Image Border
Minimum window size (PAS 5500 and TWINSCAN)
Bar code
The 24-character bar code option
The 2D-Barcode option
Human Readable code
Release pin (R-pin) area
Pellicle Design
General requirements for pellicles
Pellicle location lines
Reticle Layout (4x reduction)
PAS 5500/3x0
PAS 5500/3x0 reticle pattern location
Reticle and pellicle dimensions for PAS 5500/3x0
PAS 5500 Step & Scan family
PAS 5500 reticle pattern location
Reticle and pellicle dimensions for PAS 5500 Step & Scan
TWINSCAN
TWINSCAN reticle pattern location
Reticle and pellicle dimensions for TWINSCAN
TWINSCAN Reticle Shape Correction
Chromium-border and pellicle-frame specifications
RBA and TTL Compatible reticle for Step & Scan systems
PAS 5500 Step & Scan models, and TWINSCAN reticle pattern location
Reticle and pellicle dimensions for RBA and TTL compatible reticles
Reticles for 5x reduction
Definition of terms and concepts
Introduction
Reticle layout and orientation
Generic Information on Reticle Design
Reticle substrate specifications
Contamination and Defects
Bar Code
Reticle prealignment mark
Reticle alignment mark
Reticle Data files
Reticle Patterns (5x reduction)
Reticle prealignment mark
Reticle alignment mark
Bar Code
The 24-character bar code option
Pellicle position lines
Human readable code
Image border
Minimum window
General requirements for Pellicles
Reticle Layout (5x reduction)
PAS 5500/22
PAS 5500/60
PAS 5500/80
PAS 5500/90
PAS 5500/1xx series
PAS 5500/2xx series
Product Documentation
CONFIGURATION
SYS : PAS5500 series, TWINSCAN series
HW : 6 Inch reticles for 4x and 5x demagnification
SW : n.a.
Order Code
50163
Status
Final
Issue date
18 Jun 2007
Issue
2.1
ASML Confidential
This document is provided for employees of ASML and for selected employees of ASML's customers and agents,
in order to assist them in efficient use of ASML products. The document must not be disclosed to third parties.
RETICLE DESIGN MANUAL
6 Inch reticles
Copyright © 2007, ASML Holding N.V. (including affiliates). All rights reserved.
Disclaimer
Trademarks
This publication is subject to change without notice and contains confidential and proprietary information of
ASML Holding N.V. or its affiliates ("ASML").
This documentation is for the intended purpose only and for the use of the intended recipient only. Please
retain control of this documentation. It is not to be forwarded or distributed. Any unauthorized review,
copying, use, disclosure or distribution is strictly prohibited. The material herein is provided "AS-IS" and
ASML makes no warranty of any kind with regard to this material.
ASML shall not be liable for errors and omissions contained herein.
ASML, ASM Lithography, TWINSCAN, PAS 5500, PAS 5000, SA 5200, ATHENA, QUASAR, IRIS, ILIAS,
FOCAL, CPL, DDL, Micralign, Micrascan, 3DAlign, 2DStitching, 3DMetrology, MaskTools, LithoServer,
LithoGuide, Scattering Bars, MaskWeaver, LithoCruiser, LithoCool, AGILE, ImageTuner, EFESE and the
ASML logo are trademarks of ASML Holding N.V. or affiliate companies.
The trademarks may be used either alone or in combination with a further product designation.
Starlith, AERIAL, AERIAL II and, AERIAL XP are trademarks of Carl Zeiss.
Nothing in this publication is intended to make representations with regard to whether any trademark is
registered or to suggest that any sign other than those mentioned should not be considered to be a
trademark of ASML or of any third party.
Translation of
Documents
If this document is in a language other than English, please read the following text carefully.
While we strive to ensure that the information is translated correctly, no warranty or guarantee, express or
implied, is given as to its accuracy or that it is as current as the English version. We accept no liability for
any errors or omissions.
We shall not be liable for any damages (including, without limitation, damages for loss of business or loss of
profits) arising in contract, tort or otherwise from the use of or inability to use this document, or any material
contained in it, or from any action or decision taken as a result of using such material. If there is any conflict
or difference between the translated version of this document and its English version, the English version is
leading. If any part of the translated version is unclear, reference should be made to the English version.
Feedback
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Please include:
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Thank you for your support.
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TABLE OF CONTENTS
PART I
Chapter 1
Chapter 2
Chapter 3
Preface . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .iii
RETICLES FOR 4X REDUCTION
Definitions of terms and concepts . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 3
Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 4
The definition of a location on a reticle . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5
Reticle Layout and Orientation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 6
The definition of chromium border . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8
Name conventions for TIS marks. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9
The birefringence of the substrate
Phase Shift Mask (PSM) reticles
Generic Information on Reticle Design. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 11
Reticle substrate Specifications . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 12
12
13
Reticle compatibility . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 14
Contamination and Defects . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15
15
15
15
Reticle Data files . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 16
17
17
Data files on Wafer Alignment Marks . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 19
Bar code
Reticle prealignment mark
Reticle alignment mark
Reticle Database Format information
Typical usage
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The chromium borders for TIS_RBA marks
TIS_RBA-mark dimensions
Required chromium border between image field and TIS mark
TIS marks placement on production reticles
Reticles Patterns (4x reduction) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 21
Reticle Prealignment mark . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 22
Reticle alignment mark for PAS 5500 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 23
TIS marks for Reticle Blue Alignment . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 25
26
27
28
28
TIS marks for Reticle Shape Correction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 29
29
30
31
31
How to deal with third-party reticle patterns . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 33
Image Border . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 35
38
Bar code . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39
39
41
Human Readable code . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 47
Release pin (R-pin) area . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 47
The layout of TIS_RSC marks
Chromium borders for vertical TIS_RSC marks
Chromium border between image field and vertical TIS_RSC marks
Vertical TIS_RSC marks placement on production reticles
The 24-character bar code option
The 2D-Barcode option
Minimum window size (PAS 5500 and TWINSCAN)
ii
Table of Contents
Pellicle Design . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 48
48
49
General requirements for pellicles
Pellicle location lines
Chapter 4
PART II
Chapter 5
Chapter 6
Chapter 7
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PAS 5500/3x0 reticle pattern location
Reticle and pellicle dimensions for PAS 5500/3x0
PAS 5500 reticle pattern location
Reticle and pellicle dimensions for PAS 5500 Step & Scan
Reticle Layout (4x reduction). . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 51
PAS 5500/3x0 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 52
52
54
PAS 5500 Step & Scan family . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 56
57
58
TWINSCAN . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 60
61
62
TWINSCAN Reticle Shape Correction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 65
65
RBA and TTL Compatible reticle for Step & Scan systems . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 68
68
70
PAS 5500 Step & Scan models, and TWINSCAN reticle pattern location
Reticle and pellicle dimensions for RBA and TTL compatible reticles
TWINSCAN reticle pattern location
Reticle and pellicle dimensions for TWINSCAN
Chromium-border and pellicle-frame specifications
RETICLES FOR 5X REDUCTION
Definition of terms and concepts . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 73
Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 74
Reticle layout and orientation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 75
Generic Information on Reticle Design . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 77
Reticle substrate specifications . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 78
Contamination and Defects. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 78
78
78
79
Reticle Data files . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 79
Bar Code
Reticle prealignment mark
Reticle alignment mark
The 24-character bar code option
Reticle Patterns (5x reduction) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 81
Reticle prealignment mark . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 83
Reticle alignment mark . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 84
Bar Code . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 86
87
Pellicle position lines. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 89
Human readable code . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 89
Image border . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 89
91
General requirements for Pellicles. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 91
Minimum window
Chapter 8
Reticle Layout (5x reduction). . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 93
PAS 5500/22 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 94
PAS 5500/60 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 98
PAS 5500/80 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 102
PAS 5500/90 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 106
PAS 5500/1xx series . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 110
PAS 5500/2xx series . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 114
PREFACE
Note
Please note that with the introduction of this manual the reticle design
specifications of previous releases of the Reticle Design Manual are not valid
anymore.
The PAS 5500 wafer steppers
The PAS 5500 Step & Scan models
The TWINSCAN models.
This manual gives a description of the layout requirements for reticles used in the
6-inch reticle versions of:
•
•
•
Also described in this manual are:
•
•
•
•
The areas which can be used for identification of the reticle.
The pellicle specifications for the various reticles.
The defect specifications for the various reticle patterns.
The release pin areas.
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Note
Any deviation from the positions or dimensions described may cause
damage to, or malfunctioning of the system.
A Calma GDS2 description, in STREAM format, of all the reticle layers of different
systems, the TIS mark set and typical alignment marks is available on ASML
CustomerNet.
For additional help with reticle patterns, please contact your local ASML sales office.
iv
Preface
IMPROVEMENTS
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With reference to the previously released Reticle Design Manual (50163 issue 2.0)
this manual contains the following improvements and changes:
•
The section that describes the Bar Code (see “Bar code” on page 39) is improved.
An error in the example of Figure 3.12. was corrected. (please note that the
–
actual bar codes did not change, only the example “A”)
The text in the Bar Code section and Figure 3.14 did not match. Therefore it
was not clear how to position the bar code on the reticle. The text is now in
line with Figure 3.14 and Figure 3.13 is added for additional clarification.
–
With reference to the previously released Reticle Design Manual (50163 issue 1.1)
this manual contains the following improvements and changes:
•
•
•
•
•
•
•
Section on vertical TIS_RSC mark use is updated.
The 2D Barcode option is incorporated into the manual.
The manual is updated for the support of XT:1700i and XT:1900i.
A specification for image rotation on 5x reticles is added.
Some drawings/illustrations are added/improved for more clarity.
Some parts of the text are improved for more clarity.
In chapter 8 some tables were misplaced. This is corrected.
50163
18 Jun 2007
I
RETICLES FOR 4X REDUCTION
A DESCRIPTION OF THE LAYOUT OF 6 INCH RETICLES USED IN:
•
•
•
THE PAS 5500/3X0 WAFER STEPPER
THE PAS 5500 STEP & SCAN MODELS
THE TWINSCAN MODELS.
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